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Assemblage and testing of the device for water ozonizing and its application for silicon wafer cleaning
Ředina, Dalibor ; Mikulík, Petr (referee) ; Voborný, Stanislav (advisor)
Deionised-ozonated water, so-called DIO3 appears to be an ideal alternative for usage in semiconductor industry. The utilisation of DIO3 for removal of photoresist from silicon wafers is faster, cheaper, and more environmental-friendly compared to classical technology based on mixture of sulphuric acid with hydrogen peroxide, so-called SPM. The diploma thesis deals firstly with research into ozone and ozonated water and their possible applications. Next sections describe two prototypes of generators for DIO3, that were assembled in CSVG a.s. Testing of parameters for generators on dissolved-ozone concentration is also a part of this thesis. Moreover, thesis involves tests, that were carrier out in ON Semiconductor in Rožnov pod Radhoštěm. These tests compare efficiency of cleaning by classical technology based on SPM and DIO3 approach.
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Recovery of Waste Semiconductors for CVD Precursors.
Bumba, Jakub ; Dytrych, Pavel ; Fajgar, Radek ; Dřínek, Vladislav
The newly patented method for regeneration of ultrapure silicon and germanium via magnesium silicide and magnesium germanide from waste photovoltaic (PV) cells, broken germanium lenses and waste magnesium chips was utilized to obtain chemical vapour deposition (CVD) precursors for application in electronics, optics or nanoparticles synthesis. Magnesium silicide and germanide were prepared directly by thermal synthesis from waste materials in optimized tube reactor at 400°C and 5 Pa. X-Ray Diffraction (XRD) confirmed 97.9% respective 95% purity of products. The presence of silicon and germanium hydrides (CVD precursors) prepared by acid hydrolysis in the second step of the process was verified by Gas Chromatography–Mass Spectroscopy (GC/MS) and Fourier Transform Infrared Spectroscopy (FTIR). The crude, unrefined mixture of silicon hydrides served as raw material for CVD experiment at different substrates. SEM images confirmed occurrence of various micro and nano particles which could be used in electronics, optics and catalysis.
Fulltext: content.csg -  PDF
Plný tet: SKMBT_C22019011614381 - PDF
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Assemblage and testing of the device for water ozonizing and its application for silicon wafer cleaning
Ředina, Dalibor ; Mikulík, Petr (referee) ; Voborný, Stanislav (advisor)
Deionised-ozonated water, so-called DIO3 appears to be an ideal alternative for usage in semiconductor industry. The utilisation of DIO3 for removal of photoresist from silicon wafers is faster, cheaper, and more environmental-friendly compared to classical technology based on mixture of sulphuric acid with hydrogen peroxide, so-called SPM. The diploma thesis deals firstly with research into ozone and ozonated water and their possible applications. Next sections describe two prototypes of generators for DIO3, that were assembled in CSVG a.s. Testing of parameters for generators on dissolved-ozone concentration is also a part of this thesis. Moreover, thesis involves tests, that were carrier out in ON Semiconductor in Rožnov pod Radhoštěm. These tests compare efficiency of cleaning by classical technology based on SPM and DIO3 approach.
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